昇温脱離（TPD）

昇温脱離（TPD）は、半導体の製造分野において、以下のような貢献ができます。

1. 表面処理の評価と最適化

洗浄プロセスの評価: 半導体製造では、ウェハ表面の清浄度が非常に重要です。TPDを用いることで、洗浄プロセス後のウェハ表面に残留する不純物（有機物、金属など）の種類や量を評価できます。これにより、洗浄プロセスの効果を検証し、最適化することができます。

表面改質プロセスの評価: 半導体デ

昇温脱離を考える。

昇温脱離（Temperature Programmed Desorption、TPD）とは、物質の表面に吸着した分子や原子を、温度を徐々に上昇させることで脱離させ、その脱離する温度や脱離量を測定する分析手法です。

基本原理

物質の表面に分子や原子が吸着すると、それらは表面と特定の結合エネルギーで結びつきます。

温度を上昇させると、吸着種は熱エネルギーを得て、表面との結合を断ち切り、気相中に脱

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